Ongoing numerous technological advancements, growing semiconductor industry and huge investments in research & developments is likely to boost the Global Photolithography Equipment Market through the forecast period.
According to TechSci Research report, “Photolithography Equipment Market – Global Industry Size, Share, Trends, Opportunity, and Forecast, 2017-2027” Global Photolithography Equipment Market stood at USD 15,904.02 million in 2021 and is expected to register a CAGR of 16.70% during the forecast period. In 2021, two significant multinational corporations, International Business Machine Corporation (IBM), a technology multinational with its headquarters in the United States, and Samsung, a semiconductor multinational with its headquarters in South Korea, announced a new semiconductor design that prioritises efficiency and power while also satisfying the demand for new semiconductor technology on a global scale. The innovative design employs a unique vertical transistor architecture that provides a way to scale beyond nanosheet and has the potential to use 85% less energy than a scaled fin field-effect transistor (finFET)1.
The new technology, according to IBM, also emphasises the crucial role that spending on chip research plays in the semiconductor industry, along with how it is later developed for application in a variety of sectors. Among the places where technology is used are essential infrastructure, transportation systems, communication devices, and appliances. The company anticipates that the new design will help in advancing these fields in the upcoming years.
Browse over 202 market data Figures spread through 277 Pages and an in-depth TOC on “Global Photolithography Equipment Market”
https://www.techsciresearch.com/report/photolithography-equipment-market/7407.html
Global Photolithography Equipment Market can is segmented on the basis of type, DUV type, wavelength, device wavelength, end-use, application, and region. In terms of type, DUV is the leading segment in the Global Photolithography Equipment Market accounting for share of 67.45% in 2021 and register a CAGR of 15.49% during the forecast period. DUV processes have the potential to significantly improve cloud performance and deploy innovations in AI applications. Improvement in chip performance and reduction in power requirements are being preferred in cloud and AI applications. Moreover, DUV provides better features than others such as advancements in critical dimension uniformity, better overlay control, lower sensitivity to incoming wafer topography, higher reliability with less tool maintenance, and higher throughput.
Major market players operating in the global photolithography equipment market are:
- ASML Holding N.V.
- Canon Inc.
- EV Group (EVG)
- GlobalFoundries Inc.
- Nikon Corporation
- Veeco Instruments Inc.
- SUSS MicroTec SE
- Taiwan Semiconductor Manufacturing Company Limited
- Eulitha AG
- NuFlare Technology Inc.
Download Free Sample Report:
https://www.techsciresearch.com/sample-report.aspx?cid=7407
Customers can also request for 10% free customization on this report.
“In terms of device wavelength, excimer laser is the leading segment in the Global Photolithography Equipment Market accounting for a share of 62.55% in 2021 and the segment is also expected to register a CAGR of 15.96%, during the forecast period. Excimer layers have higher pulse energy, shorter pulse duration and shorter wavelengths than other layers. Moreover, in healthcare industry, excimer layers ensure safety because they are capable of power levels of several hundred watts and are easily capable of considerable damage to an operator’s eyes or skin.”, said Mr. Karan Chechi, Research Director with TechSci Research, a research-based global management consulting firm.
“Photolithography Equipment Market – Global Industry Size, Share, Trends, Opportunity, and Forecast, 2017-2027, By Type (EUV (Extreme Ultraviolet), DUV (Deep Ultraviolet)), By DUV Type (ArFi (Argon Fluoride Immersion, KrF (Krypton Fluoride), ArF (Argon Fluoride), I-Line)), By Wavelength (1nm-170nm, 170nm-270nm, 270nm-370nm), By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Laser Produced Plasma), By End-Use (IDMs (Integrated Device Manufacturer), Foundries ), By Application (Back-End, Front-End), By Region”, has evaluated the future growth potential of global photolithography equipment market and provides statistics & information on market size, structure, and future market growth. The report intends to provide cutting-edge market intelligence and help decision makers take sound investment decisions. Besides, the report also identifies and analyzes the emerging trends along with essential drivers, challenges, and opportunities in global photolithography equipment market.
Contact
Mr. Ken Mathews
708 Third Avenue,
Manhattan, NY,
New York – 10017
Tel: +1-646-360-1656
Email: sales@techsciresearch.com
Website: https://www.techsciresearch.com